Method for E-beam writing

Details Method for E-beam writing Method for E-beam writing

1996-10-24

1997-10-14

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430330, 430942, 2504922, G03F 738

Patent

active

056771096

ABSTRACT:
A method for writing on a semiconductor wafer using electron beams is provided. One embodiment of the method includes the steps of using electron beams to irradiate a semiconductor substrate on which a resist layer has been formed, to thereby draw patterns on the resist layer, and then baking the resist layer and substrate in a vacuum.

REFERENCES:
patent: 4348473 (1982-09-01), Okumura
patent: 5106455 (1992-04-01), Jacobsen
patent: 5127987 (1992-07-01), Okudaira

Affiliated with

Also associated with

Rating

Method for E-beam writing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for E-beam writing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for E-beam writing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1553983