Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1997-02-14
2000-01-11
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430325, 216 62, G03F 726
Patent
active
060134186
ABSTRACT:
A lithographic process for device fabrication is disclosed in which a hydrogen fluoride vapor is used to develop a pattern from an image introduced into an energy sensitive resist material. A class of silicon-containing materials display excellent sensitivity in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. When these materials are patternwise exposed to radiation in the presence of oxygen, the oxygen content of the unexposed region is significantly different from the oxygen content in the exposed region. The pattern is developed using HF because the higher oxygen content material is etched at a faster rate by HF than the lower oxygen content material. Materials are deposited from the vapor phase and show excellent promise for use as resists in the fabrication of electronic and optical devices.
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Ma Yi
Weidman Timothy William
Botos Richard J.
Duda Kathleen
Lucent Technologies - Inc.
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