Method for developing a resist pattern

Details Method for developing a resist pattern Method for developing a resist pattern

1994-02-24

1995-12-12

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430330, 430322, G03F 740, G03F 730

Patent

active

054748771

ABSTRACT:
A photoresist pattern developed on a semiconductor substrate is rinsed by rinsing liquid. At this rinsing step, the rinsing liquid is heated to be decreased in surface tension, so that the collapse of the photoresist pattern is avoided.

REFERENCES:
patent: 5212043 (1993-05-01), Yamamoto
patent: 5223377 (1993-06-01), Samarakone et al.

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