Method for designing a reticle mask

Details Method for designing a reticle mask Method for designing a reticle mask

1997-06-03

1998-08-04

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

364488, G03F 900

Patent

active

057891206

ABSTRACT:
A method for designing a reticle mask with a reduced pattern by use of another larger reticle mask having a circuit pattern and scribe line patterns on lower and right edges of the circuit pattern. In the method, the larger circuit pattern is modified by forming two dummy scribe line regions at upper and left edges of the larger circuit pattern. The modified mask pattern is then reduced. The reduced mask pattern is repeatedly copied on a reticle frame region, with at least one of the dummy scribe line regions overlapping at least one of the scribe line regions of an adjacent reduced mask pattern.

REFERENCES:
patent: 5541025 (1996-07-01), Oi et al.

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