Method for depositing aluminum layers on insulating oxide substr

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

20419215, 20419225, 4272551, 4272552, 437165, C23C 408

Patent

active

053306295

ABSTRACT:
A manufacturing method which includes forming a metallic, aluminum-containing layer adherent to a surface of a body. The method includes the steps of depositing aluminum on the surface from an aluminum-containing vapor, and during the aluminum-depositing step, the further step of depositing arsenic, phosphorus, or antimony on the surface from the vapor.

REFERENCES:
patent: 3391017 (1968-07-01), Bolger et al.
patent: 4254189 (1981-03-01), Fisher
patent: 4450207 (1984-05-01), Donomoto et al.
patent: 4462881 (1984-07-01), Yamamoto et al.
patent: 4975299 (1990-12-01), Mir et al.
patent: 5071791 (1991-12-01), Inoue et al.
patent: 5118661 (1992-06-01), Maeda
patent: 5171642 (1992-12-01), DeHaven et al.
patent: 5217589 (1993-06-01), Arledge et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for depositing aluminum layers on insulating oxide substr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for depositing aluminum layers on insulating oxide substr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for depositing aluminum layers on insulating oxide substr will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-517659

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.