Method for conditioning a process chamber

Details Method for conditioning a process chamber Method for conditioning a process chamber

2011-03-15

2011-03-15

Kackar, Ram N. (Department: 1716)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C156S345240, C438S005000, C118S715000, C134S001200

Reexamination Certificate

active

07906032

ABSTRACT:
A method of conditioning a processing chamber for a production process includes performing a conditioning step at a conditioning process recipe substantially different than a process recipe of the production process, and performing a warm-up process at a warm-up process recipe substantially the same as the process recipe of the production process. The method can be performed after a wet-cleaning process has been performed. The conditioning procedure can allow the maintenance time to be decreased and can cause the etched features to be more accurate.

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