Method for cleaning a process chamber

Details Method for cleaning a process chamber Method for cleaning a process chamber

2005-06-07

2005-06-07

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

Gas or vapor condensation or absorption on work

C134S001100, C134S022100, C134S022180, C134S026000, C134S030000, C134S902000, C216S063000, C216S067000, C216S068000, C438S905000

Reexamination Certificate

active

06902629

ABSTRACT:
Methods and apparatus for cleaning deposition chambers are presented. The cleaning methods include the use of a remote plasma source to generate reactive species from a cleaning gas to clean deposition chambers. A flow of helium or argon may be used during chamber cleaning. Radio frequency power may also be used in combination with a remote plasma source to clean deposition chambers.

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