Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Patent
1996-07-17
1999-06-01
Marschel, Ardin H.
Cleaning and liquid contact with solids
Processes
Hollow work, internal surface treatment
4221291, 4221841, 422186, 422211, 422255, 134 2, 134 3, 134 4, 134 6, 134 10, 134 15, 134 19, 134 221, 134 2211, 134 2213, 134 2214, 134 2216, 134 2217, 134 2218, 134 2219, 134 23, 134 24, 134 26, 134 40, 134 41, B08B 900
Patent
active
059080418
ABSTRACT:
A method and apparatus for cleaning a spray stream nozzle employed in dispensing upon a photoexposed blanket photoresist layer formed over a semiconductor substrate a photoresist developer solution. There is first provided a spray stream nozzle having a minimum of one aperture formed therein. There is then provided through the spray stream nozzle a volume of a photoresist developer solution sufficient to develop a photoexposed blanket photoresist layer formed over a semiconductor substrate placed beneath the spray stream nozzle. Finally, there is provided then through the spray stream nozzle a volume of a solvent which is not susceptible to clogging the spray stream nozzle.
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Lin Tsun-Ching
Wang Jo-Fei
Wei Gey-Fung
Yeh Hsiao-Lan
Ackerman Stephen B.
Marschel Ardin H.
Saile George O.
Szecsy Alek P.
Taiwan Semiconductor Manufacturing Company , Ltd.
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