4. Coating apparatus
  5. Gas or vapor deposition

Hsiao-Lan Yeh

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Method and apparatus for automatic purge of HMDS vapor piping

Coating apparatus – Gas or vapor deposition
Patent

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Method and apparatus for automatic purge of HMDS vapor piping

Coating processes – Coating by vapor – gas – or smoke
Patent

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Method for cleaning a photoresist developer spray stream nozzle

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Patent

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Profile ID: LFUS-PAI-P-1110613

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