Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate
2011-01-11
2011-01-11
Ghyka, Alexander G (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
By reaction with substrate
C438S685000, C257SE21326
Reexamination Certificate
active
07867915
ABSTRACT:
Provided is a method for controllably activating a surface for stable amine-reactive chemistries. A surface containing nitride is exposed to a plasma having a reactive species containing hydrogen for a period of time sufficient to activate the substrate for amine-reactive chemistries. Amine-reactive chemical processes can then be applied to the activated surface to reliably and controllably bond molecules directly to said surface. The method is designed to create stable primary amines on the nitride substrate, so that any subsequent amine-reactive chemistry may proceed in a controlled manner that is directly proportional to the density of surface amines so created.
REFERENCES:
patent: 4465552 (1984-08-01), Bobbio et al.
patent: 6475277 (2002-11-01), Hirota et al.
patent: 7485799 (2009-02-01), Guerra
patent: 2006/0264525 (2006-11-01), Ohwaki et al.
Holloway et al., Journal of the Electrochemical Society 723, 123 (1976).
Matsuo et al., Sensors and Actuators 77, 1 (1981).
Harame, et al., IEEE Transactions on Electron Devices 1700, 34 (1987).
Gao, et al. Sensors and Actuators B 38-39, 38 (1997).
Manning et al., Langmuir 395, 21 (2005).
Karymov, et al., Sensors and Actuators B 324, 29 (1995).
Karymov, et al., Langmuir 4748, 12 (1996).
Cole Christina L
Whitman Lloyd J
Ghyka Alexander G
Ressing Amy
Roberts Roy
The United States of America as represented by the Secretary of
LandOfFree
Method for activating nitride surfaces for amine-reactive... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for activating nitride surfaces for amine-reactive..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for activating nitride surfaces for amine-reactive... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2681013