Method and system for patterning alignment marks on a...

Optical: systems and elements – Optical modulator – Light wave temporal modulation

Reexamination Certificate

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C359S223100

Reexamination Certificate

active

07450296

ABSTRACT:
Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.

REFERENCES:
patent: 6083806 (2000-07-01), Mancini et al.
patent: 6356378 (2002-03-01), Huibers
patent: 6529310 (2003-03-01), Huibers et al.
patent: 6947196 (2005-09-01), Chen et al.
patent: 2004/0012838 (2004-01-01), Huibers

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