Method and system for metrology recipe generation and review...

Details Method and system for metrology recipe generation and review... Method and system for metrology recipe generation and review...

2007-04-17

2007-04-17

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

Reexamination Certificate

active

10865047

ABSTRACT:
A method of generating a metrology recipe includes identifying regions of interest within a device layout. A coordinate list, which corresponds to the identified regions of interest, can be provided and used to create a clipped layout, which can be represented by a clipped layout data file. The clipped layout data file and corresponding coordinate list can be provided and converted into a metrology recipe for guiding one or more metrology instruments in testing a processed wafer and/or reticle. The experimental metrology results received in response to the metrology request can be linked to corresponding design data and simulation data and stored in a queriable database system.

REFERENCES:
patent: 6415421 (2002-07-01), Anderson et al.
patent: 6425113 (2002-07-01), Anderson et al.
patent: 6510730 (2003-01-01), Phan et al.
patent: 6523162 (2003-02-01), Agrawal et al.
patent: 6823496 (2004-11-01), Bergman Reuter et al.
patent: 2003/0229410 (2003-12-01), Smith et al.
patent: 2004/0102934 (2004-05-01), Chang

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