Method and system for mask handling in high productivity...

Details Method and system for mask handling in high productivity... Method and system for mask handling in high productivity...

2011-08-09

2011-08-09

MacArthur, Sylvia R. (Department: 1716)

Coating apparatus

Gas or vapor deposition

Work support

C414S416010, C156S345230, C156S345100, C206S832000

Reexamination Certificate

active

07993461

ABSTRACT:
A structure for independently supporting a wafer and a mask in a processing chamber is provided. The structure includes a set of extensions for supporting the wafer and a set of extensions supporting the mask. The set of extensions for the wafer and the set of extensions for the mask enable independent movement of the wafer and the mask. In one embodiment, the extensions are affixed to an annular ring which is capable of moving in a vertical direction within the processing chamber. A processing chamber, a mask, and a method for combinatorially processing a substrate are also provided.

REFERENCES:
patent: 6251188 (2001-06-01), Hashimoto et al.
patent: 2008/0295962 (2008-12-01), Endo et al.

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