Method and system for improving critical dimension uniformity

Details Method and system for improving critical dimension uniformity Method and system for improving critical dimension uniformity

2007-02-13

2009-08-04

Von Buhr, M. N. (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S051000

Reexamination Certificate

active

07571021

ABSTRACT:
A method for improving critical dimension of a substrate is provided. Manufacturing data of a plurality of critical dimension deviations corresponding to a plurality of areas on the substrate is collected. A plurality of sensitivity data corresponding to the plurality of areas is also collected. A plurality of exposure dosage offsets corresponding to the plurality of areas are calculated based on the plurality of critical dimension deviations and the plurality of sensitivity data.

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