Method and system for generating a bit pattern

Image analysis – Histogram processing – For setting a threshold

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382 8, G06K 938

Patent

active

054044103

ABSTRACT:
A pattern defect inspection apparatus according to this invention comprises an irradiation circuit for irradiating a substrate on which a given pattern is drawn, a detector circuit for detecting said irradiated pattern on said substrate, a bit pattern generating circuit for quantizing and generating previously given design data by processing said design data based on specified figure information to obtain bit pattern data composed of a finite number of pixels, and a comparator circuit for detecting defects on said substrate by comparing the detected data from said detecting means with the data from said bit pattern generating means, wherein the bit pattern generating circuit has an additional parameter conditioner for setting the dimension of each pixel to be quantized into said bit pattern data to the desired value.

REFERENCES:
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patent: 4633503 (1986-12-01), Hinman
patent: 4809341 (1989-02-01), Matsui et al.
patent: 4942619 (1990-07-01), Takagi et al.
patent: 5097518 (1992-03-01), Scott et al.
patent: 5113455 (1992-05-01), Scott
patent: 5301248 (1994-04-01), Takanori et al.
Ryoichi Yoshikawa, et al. "Automated Reticle Pattern Inspection Systems for VLSI", Spring 1984, pp. 44-48.

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