Image analysis – Histogram processing – For setting a threshold
Patent
1994-01-10
1995-04-04
Couso, Jose L.
Image analysis
Histogram processing
For setting a threshold
382 8, G06K 938
Patent
active
054044103
ABSTRACT:
A pattern defect inspection apparatus according to this invention comprises an irradiation circuit for irradiating a substrate on which a given pattern is drawn, a detector circuit for detecting said irradiated pattern on said substrate, a bit pattern generating circuit for quantizing and generating previously given design data by processing said design data based on specified figure information to obtain bit pattern data composed of a finite number of pixels, and a comparator circuit for detecting defects on said substrate by comparing the detected data from said detecting means with the data from said bit pattern generating means, wherein the bit pattern generating circuit has an additional parameter conditioner for setting the dimension of each pixel to be quantized into said bit pattern data to the desired value.
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Ryoichi Yoshikawa, et al. "Automated Reticle Pattern Inspection Systems for VLSI", Spring 1984, pp. 44-48.
Tabata Mitsuo
Tojo Toru
Tsuchiya Hideo
Yamashita Kyoji
Yoshikawa Ryoichi
Couso Jose L.
Kabushiki Kaisha Toshiba
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