Method and system for fabricating three-dimensional...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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Reexamination Certificate

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08071277

ABSTRACT:
A method and system are provided for fabricating three-dimensional (3D) structures having micron or submicron features. The method includes providing a continuously-formed relief structured material, the relief structured material having a first layer comprising a material having a pattern of relief structures formed on a first surface thereof. The structured material includes second layer comprising a photosensitive material that is disposed on the first layer. The relief structured material is exposed to radiation through the first layer, where the pattern of relief structures formed on the first surface of the first layer generates a 3-dimensional light intensity pattern of the radiation that is incident on the second layer. The exposed material is developed, where the developed material comprises a plurality of 3D structures having micron or submicron features.

REFERENCES:
patent: 5425848 (1995-06-01), Haisma et al.
patent: 5851674 (1998-12-01), Pellerite et al.
patent: 6696157 (2004-02-01), David et al.
patent: 6824882 (2004-11-01), Boardman et al.
patent: 6849558 (2005-02-01), Schaper
patent: 7173778 (2007-02-01), Jing et al.
patent: 7229868 (2007-06-01), Bernds et al.
patent: 2005/0048288 (2005-03-01), Flynn et al.
patent: 2005/0124712 (2005-06-01), Anderson et al.
patent: 2006/0286488 (2006-12-01), Rogers et al.
patent: 2007/0003876 (2007-01-01), Schilling et al.
patent: 2008/0315459 (2008-12-01), Zhang et al.
Brinker, C.J. & Scherer, G.W.;Sol-Gel Science; Academic Press, NY; pp. 501-505 (1990).
Michel, B. et al., “Printing Meets Lithography: Soft Approaches to High-resolution Patterning,”IBM Journal of Research&Development(Sep. 2001); vol. 45, No. 5; pp. 697-719.
Fiegel, A. et al., “Scalable Interference Lithography Alignment for Fabrication of Three-Dimensional Photonic Crystals,”Optics Letters(May 1, 2002); vol. 27, No. 9; pp. 746-748.
Serbin, J. et al., “Three-Dimensional Nanostructuring of Hybrid Materials by Two-Photon Polymerization,”Proceedings of SPIE, the Int. Soc. Opt. Eng. (2003); vol. 5222, No. 1; pp. 171-177.
Tanaka, Y. et al., “Theoretical Investigation of a Two-Dimensional Photonic Crystal Slab with Truncated Cone Air Holes,”Applied Physics Letters(Mar. 17, 2003); vol. 82, No. 11; pp. 1661-1663.
Divliansky, I. et al., “Fabrication of Three-Dimensional Polymer Photonic Crystal Structures Using Single Diffraction Element Interference Lithography,”Applied Physics Letters(Mar. 17, 2003); vol. 82, No. 11; pp. 1667-1669.
Ullal, C.K. et al., “Triply Periodic Bicontinuous Structures Through Interference Lithography: A Level-Set Approach,”Journal Optical Society America A(May 2003); vol. 20, No. 5; pp. 948-954.
Prather, D.W. et al., “Fabrication of Three-Dimensional Photonic Crystals Using Lithographic Processes,”Proceedings of SPIE, the Int. Soc. Opt. Eng. (2004); vol. 5347, No. 1; pp. 224-232.
Jeon, S. et al., “Fabricating Complex Three-Dimensional Nanostructures with High-Resolution Conformable Phase Masks,”Proceedings of the National Academy of Sciences of the USA(Aug. 24, 2004); vol. 101, No. 34; pp. 12428-12433.
Mizeikis, V. et al., “Three-Dimensional Woodpile Photonic Crystal Templates for the Infrared Spectral Range”,Optics Letters(Sep. 1, 2004); vol. 29, No. 17; pp. 2061-2063.
Meisel, D.C. et al., “Three-Dimensional Photonic Crystals by Holographic Lithography Using the Umbrella Configuration: Symmetries and Complete Photonic Band Gaps”,Physical Review B(Oct. 13, 2004); vol. 70; pp. 165104-1 to 165104-9.
Zanke, C. et al., “Large-Area Patterning for Photonic Crystals Via Coherent Diffraction Lithography”,Journal of Vacuum Science Technology B(Nov./Dec. 2004); vol. 22, No. 6; pp. 3352-3355.
Yao, P. et al., “Fabrication of Three-Dimensional Photonic Crystals with Multilayer Photolithography”,Optics Express(Apr. 4, 2005); vol. 13, No. 7; pp. 2370-2376.
Wu, L. et al., “Fabrication of Large Area Two- and Three-Dimensional Polymer Photonic Crystals Using Single Refracting Prism Holographic Lithography”,Applied Physics Letters(2005); vol. 86; pp. 241102-1 to 241102-3.
Moon, J.H. and Yang, S., “Creating Three-Dimensional Polymeric Microstructures by Multi-Beam Interference Lithography”,Journal of Macromolecular Science Part C: Polymer Reviews(2005); vol. 45; pp. 351-373.
Li, E. et al., “Predication of Multi-Dimensional Photonic Crystal Structures Generated by Multi-Beam Interference in Holographic Lithography”,Smart Materials and Structures(2006); (Institute of Physics Publishing); vol. 15; pp. S158-S164.
Liu, Y. et al., “Fabrication of Three-Dimensional Photonic Crystals with Two-Beam Holographic Lithography”,Applied Optics(Jan. 20, 2006); vol. 45, No. 3; pp. 480-483.
Chan, T.Y.M. et al., “Photonic Band-Gap Formation by Optical-Phase-Mask Lithography”,Physical Review E(Apr. 26, 2006); vol. 73; pp. 046610-1 to 046610-11.
Moon, J.H. et al., “Fabricating Three-Dimensional Polymeric Photonic Structures by Multi-Beam Interference Lithography”,Polymers for Advanced Technologies(2006); vol. 17; pp. 83-93.

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