Method and system for binding halide-based contaminants

Details Method and system for binding halide-based contaminants Method and system for binding halide-based contaminants

2011-04-12

2011-04-12

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

C156S345100

Reexamination Certificate

active

07922818

ABSTRACT:
A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the halide adsorbing material is also provided.

REFERENCES:
patent: 5377429 (1995-01-01), Sandhu et al.
patent: 5393565 (1995-02-01), Suzuki et al.
patent: 5595784 (1997-01-01), Kaim et al.
patent: 5693377 (1997-12-01), Westmoreland et al.
patent: 5698022 (1997-12-01), Glassman et al.
patent: 5745990 (1998-05-01), Lee et al.
patent: 5824365 (1998-10-01), Sandhu et al.
patent: 5900063 (1999-05-01), Boswell et al.
patent: 5902651 (1999-05-01), Westmoreland et al.
patent: 5968379 (1999-10-01), Zhao et al.
patent: 6143192 (2000-11-01), Westmoreland
patent: 6143362 (2000-11-01), Sandhu et al.
patent: 6162499 (2000-12-01), Sandhu et al.
patent: 6201219 (2001-03-01), Sandhu et al.
patent: 6206971 (2001-03-01), Umotoy et al.
patent: 6284316 (2001-09-01), Sandhu et al.
patent: 6436820 (2002-08-01), Hu et al.
patent: 6451214 (2002-09-01), Westmoreland
patent: 6454957 (2002-09-01), Westmoreland
patent: 6458416 (2002-10-01), Derderian et al.
patent: 6458701 (2002-10-01), Chae et al.
patent: 6897960 (2005-05-01), DiMeo, Jr. et al.

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