Method and structure to improve properties of tunable...

Details Method and structure to improve properties of tunable... Method and structure to improve properties of tunable...

2006-04-04

2006-04-04

Sarkar, Asok Kumar (Department: 2891)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

Reexamination Certificate

active

07022622

ABSTRACT:
A method for improving the properties of tunable etch resistant anti-reflective coatings (TERA) is disclosed. The method includes annealing the deposited layer of TERA in an environment containing at least one of hydrogen and deuterium. The annealed layer has an increased concentration of hydrogen and/or deuterium as compared to the deposited film, and may also have an additional concentration of hydrogen or deuterium at the interface between the substrate and the layer of TERA.

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