Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2011-04-12
2011-04-12
Landau, Matthew C (Department: 2813)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C257S446000, C257SE31001, C257SE31103, C257S431000
Reexamination Certificate
active
07923279
ABSTRACT:
Provided is a method of fabricating an image sensor device. The method includes providing a semiconductor substrate having a front side and a back side, forming a first isolation structure at the front side of the semiconductor substrate, thinning the semiconductor substrate from the back side, and forming a second isolation structure at the back side of the semiconductor substrate. The first and second isolation structures are shifted with respect to each other.
REFERENCES:
patent: 6458619 (2002-10-01), Irissou
patent: 2009/0057801 (2009-03-01), Goushcha et al.
Hsu Tzu-Hsuan
Liu Han-Chi
Su Chun-Ming
Wang Ching-Chun
Haynes and Boone LLP
Landau Matthew C
McCall-Shepard Sonya D
Taiwan Semiconductor Manufacturing Company , Ltd.
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