Method and device for thermal treatment of substrates

Details Method and device for thermal treatment of substrates Method and device for thermal treatment of substrates

2006-06-06

2006-06-06

Fourson, George (Department: 2823)

Coating apparatus

Gas or vapor deposition

With treating means

C029S025010, C118S725000, C118S050000, C250S503100

Reexamination Certificate

active

07056389

ABSTRACT:
The object of the invention is to measure temperature using pyrometers, in a simple and economic way, enabling precise temperature measurement, even for low temperatures. The invention presents a device and method for thermally treating substrates, wherein the substrate is exposed to at least a first and at least a second radiation; the predetermined wavelengths of the first radiation are absorbed between the first radiation source and the substrate; a radiation from the substrate is measured in the predetermined wavelength using a radiation detector arranged on the same side as a second radiation source; the second radiation from the second radiation source is modulated and determined.

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