Method and device for submicron precision pattern generation

Details Method and device for submicron precision pattern generation Method and device for submicron precision pattern generation

1988-06-28

1989-11-14

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156644, 156654, 156655, 156345, 21912169, 21912185, 21912168, 427 531, B44C 122, C03C 1500, C03C 2506

Patent

active

048804967

ABSTRACT:
A method and device for creating patterns on a wide variety of substrates. The dimensions are variable in a wide range, from sub-microscopic and upwards. The device can also be used for microsurgery type manipulations in genetic engineering: a variety of substances can be introduced into biological cells. The production of patterns is based on the guidance of the radiation, electron beam etc. via a tube having a small-diameter tapered end which is metal-coated, and which can be brought to very close proximity of the substrate.

REFERENCES:
patent: 3039515 (1962-06-01), Figlio et al.
patent: 3188284 (1965-06-01), Flinn et al.
patent: 3447985 (1969-06-01), Seitz
patent: 3597289 (1971-08-01), Kohl et al.
patent: 4359360 (1982-11-01), Harris et al.

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