Method and device for controlling the film thickness of evaporat

Details Method and device for controlling the film thickness of evaporat Method and device for controlling the film thickness of evaporat

1982-03-18

1985-07-30

Rosenberger, R. A.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

356357, G01B 1100

Patent

active

045318387

ABSTRACT:
In film thickness control, different film thicknesses are evaporated on a first monitor and a second monitor provided in an evaporation tank, light beams of the same wavelength are projected onto the first monitor and the second monitor, the reflected lights from the first monitor and the second monitor are received and the reflection factors of the light beams from the monitors are detected.

REFERENCES:
patent: 3645623 (1972-02-01), Patten
patent: 3737237 (1973-06-01), Zurasky
patent: 3869211 (1975-03-01), Watanabe et al.
Puryayev et al., "An Interferometer for Monitoring Layer Thickness During Vacuum Deposition," Soviet Journal of Optical Technology, vol. 40, No. 3, (Mar. 1973), pp. 162-164.

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