Method and composition for removing sodium-containing...

Details Method and composition for removing sodium-containing... Method and composition for removing sodium-containing...

2005-05-31

2005-05-31

Deo, Duy-Vu N. (Department: 1765)

Etching a substrate: processes

Nongaseous phase etching of substrate

C216S091000, C216S106000, C252S079100, C252S079400

Reexamination Certificate

active

06899818

ABSTRACT:
A method and composition for removing sodium-containing materials such as photoresist from microcircuit substrate material utilizes 1,2-Diaminocyclohexanetetracarboxylic Acid in an organic solvent.

REFERENCES:
patent: 6465403 (2002-10-01), Skee
Park, John L, 1998; Ka: The acid Ionization constant (http://dbhs.wvusd.k12.ca.us/webdocs/AcidBase/Ka-Intro.html).*
Topic 19-Acids and bases (http://homepage.mac.com/stray/ib/chem/AHL/topic19.html).

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