Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate
2008-07-29
2008-07-29
Moore, Karla (Department: 1792)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
Having glow discharge electrode gas energizing means
C156S345440, C156S345420, C118S7230ER
Reexamination Certificate
active
07404874
ABSTRACT:
Method and apparatus for treating an edge region of a wafer. A toroidal shaped plasma cavity has an inner diameter which is slightly less than the diameter of the wafer being treated so that only the edge region of the wafer extends into the toroidal plasma cavity. An inert gas is flowed across a front and back side of the wafer into the plasma cavity. A reactive gas is flowed directly into the plasma cavity. The gases exit the plasma cavity without flowing over the surface of the wafer.
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Title: Cleaning of Wafer Edge, Bevel and Back-Side With a Torus- Shaped Capacitively Coupled Plasma (Plasma Sources Sci. Technol. 11 (Nov. 2002) 520-524) Authors: Buil Jeon, Hong-Young Chang, Jong-Kyu Song, Chang-Won Jeon Date: Published Nov. 6, 2002 Article Enclosed.
America William George
Johnston Steven Hilton
Cohn Howard M.
Dhingra Rakesh K
International Business Machines - Corporation
Jaklitsch Lisa U.
Moore Karla
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