Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from liquid combined with subsequent diverse...
Reexamination Certificate
2008-01-08
2008-01-08
Smith, Matthew (Department: 2823)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
Fluid growth from liquid combined with subsequent diverse...
C438S509000, C438S660000, C257SE21084, C257SE21077
Reexamination Certificate
active
11446675
ABSTRACT:
The object of the disclosure is to measure temperature using pyrometers, in a simple and economic way, enabling precise temperature measurement, even for low temperatures. The disclosure presents an apparatus and method for thermally treating substrates, wherein the substrate is exposed to at least a first and at least a second radiation; the predetermined wavelengths of the first radiation are absorbed between the first radiation source and the substrate; a radiation from the substrate is measured in the predetermined wavelength using a radiation detector arranged on the same side as a second radiation source; the second radiation from the second radiation source is modulated and determined.
REFERENCES:
patent: 3471698 (1969-10-01), Mausteller et al.
patent: 4891499 (1990-01-01), Moslehi
patent: 5154512 (1992-10-01), Schietinger et al.
patent: 5359693 (1994-10-01), Nenyei et al.
patent: 5444815 (1995-08-01), Lee et al.
patent: 5628564 (1997-05-01), Nenyei et al.
patent: 5668376 (1997-09-01), Weckstrom et al.
patent: 5727017 (1998-03-01), Maurer et al.
patent: 5790750 (1998-08-01), Anderson
patent: 5790751 (1998-08-01), Gronet et al.
patent: 5861609 (1999-01-01), Kaltenbrunner et al.
patent: 5960158 (1999-09-01), Gat et al.
patent: 6191392 (2001-02-01), Hauf et al.
patent: 6310328 (2001-10-01), Gat
patent: 6359263 (2002-03-01), Tay et al.
patent: 6369363 (2002-04-01), Hauf et al.
patent: 6434327 (2002-08-01), Gronet et al.
patent: 6462315 (2002-10-01), Hauf
patent: 6614005 (2003-09-01), Walk et al.
patent: 6775471 (2004-08-01), Blersch et al.
patent: 0612862 (1994-08-01), None
patent: 0034986 (2000-06-01), None
Abstract of DE19905524, Sep. 21, 2000.
Abstract of DE4012614, Oct. 24, 1991.
Hauf Markus
Striebel Christoph
Dority & Manning P.A.
Mattson Technology Inc.
Pham Thanh Van
Smith Matthew
LandOfFree
Method and apparatus for thermally treating substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for thermally treating substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for thermally treating substrates will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3914187