Method and apparatus for rotating a semiconductor substrate

Details Method and apparatus for rotating a semiconductor substrate Method and apparatus for rotating a semiconductor substrate

2007-04-10

2007-04-10

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Processes

With work or work parts movable during treatment

C134S153000, C134S147000, C134S902000, C279S132000

Reexamination Certificate

active

10407953

ABSTRACT:
An apparatus that includes a rotatable single wafer holding bracket with one or more wafer supports disposed on the single wafer holding bracket, wherein the one or more wafer supports position a center of a wafer to be off-center from an axis of rotation of the single wafer holding bracket.

REFERENCES:
patent: 4466852 (1984-08-01), Beltz et al.
patent: 5156174 (1992-10-01), Thompson et al.
patent: 5997653 (1999-12-01), Yamasaka
patent: 6167893 (2001-01-01), Taatjes et al.
patent: 6467297 (2002-10-01), Bollinger et al.
patent: 6811618 (2004-11-01), Kuroda

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