Method and apparatus for reducing particle generation by limitin

Details Method and apparatus for reducing particle generation by limitin Method and apparatus for reducing particle generation by limitin

1996-02-09

1999-05-11

Russel, Jeffrey E.

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

118723E, 156345, 427569, C23C16/52

Patent

active

059024941

ABSTRACT:
A method and apparatus for preventing particles from dislodging from the interior of a process chamber by preventing DC bias spikes. Such DC bias spikes can be caused by variations in the power or pressure in a process chamber. DC bias spikes are prevented by ramping changes in the pressure at a rate which avoids the creation of such spikes. RF power is ramped down at a rate which avoids spikes.

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