Coating apparatus – Gas or vapor deposition
Patent
1996-01-04
1998-05-05
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
4272481, C23C 1600
Patent
active
057468346
ABSTRACT:
A reactor for depositing a material on a semiconductor wafer by a chemical vapor deposition process using a reactant gas. The reactor includes a shell defining a reaction chamber sized to receive at least one semiconductor wafer. The shell has a jet port cavity opening into the reaction chamber and extending away from the reaction chamber. The reactor also includes a reactant gas delivery system for delivering the reactant gas to the reaction chamber. The reactant gas delivery system includes a nozzle positioned within the jet port cavity for directing the reactant gas into the reaction chamber, a reactant gas source, and a reactant gas line extending between the reactant gas source and the nozzle. The reactor also includes a purge gas delivery system for delivering a purge gas to the reaction chamber. The purge gas delivery system includes a purge gas port opening into the jet port cavity for directing the purge gas into the jet port cavity, a purge gas source, and means for delivering the purge gas from the purge gas source to the purge gas port.
REFERENCES:
patent: 4147571 (1979-04-01), Stringfellow et al.
patent: 4597983 (1986-07-01), Kuhne et al.
patent: 4748135 (1988-05-01), Frijlink
patent: 4751192 (1988-06-01), Hirooka et al.
patent: 4854263 (1989-08-01), Chang et al.
patent: 4928626 (1990-05-01), Carlson et al.
patent: 4989541 (1991-02-01), Mikoshiba et al.
patent: 5279986 (1994-01-01), Maloney et al.
patent: 5298107 (1994-03-01), Scudder et al.
patent: 5316794 (1994-05-01), Carlson et al.
patent: 5332443 (1994-07-01), Chew et al.
patent: 5338363 (1994-08-01), Kawata et al.
patent: 5345999 (1994-09-01), Hosokawa
patent: 5352636 (1994-10-01), Beinglass
patent: 5355066 (1994-10-01), Lowrance
Applied Materials System Manual; AMC-7810/11 and AMC-7820/21 Cylindrical Epitaxial Reactors; patent notice; Nov. 1982 pp. 4-1 through 4-12 and 4-50 through 4-55.
Applied Materials System Manual; AMC-7800/7900 Series Cylindrical Epitaxial Reactors; patent notice; Sep. 1981; pp. 4-1 through 4-10.
Breneman R. Bruce
Lund Jeffrie R.
MEMC Electronics Materials, Inc.
LandOfFree
Method and apparatus for purging barrel reactors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for purging barrel reactors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for purging barrel reactors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-49625