4. Coating apparatus
  5. Gas or vapor deposition

Thomas Martin Hanley

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Method and apparatus for purging barrel reactors

Coating apparatus – Gas or vapor deposition
Patent

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Method for tuning barrel reactor purge system

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With a step of measuring – testing – or sensing
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Profile ID: LFUS-PAI-P-116306

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