Method and apparatus for providing flexible partially etched...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S253000, C438S393000, C438S396000

Reexamination Certificate

active

10996903

ABSTRACT:
The present subject matter includes a capacitor stack disposed in a case, the capacitor stack including one or more substantially planar electrode layers. The one or more substantially planar electrode layers have an etched surface, an unetched surface, and a grade bordering the etched surface and the unetched surface. Also, the present subject matter includes a lid conforming sealingly connected to the material defining the first aperture. Additionally, the present subject matter includes a feedthrough assembly connected to the capacitor stack and passing through the feedthrough hole and sealingly connected to the material defining the feedthrough hole. In the present subject matter, the one or more substantially planar electrode layers are made by printing a curable resin mask onto the one or more substantially planar electrode layers and etching the layers, the curable resin mask defining the grade and adapted to resist etching.

REFERENCES:
patent: 5384685 (1995-01-01), Tong et al.
patent: 5660737 (1997-08-01), Elias et al.
patent: 5711988 (1998-01-01), Tsai et al.
patent: 5800857 (1998-09-01), Ahmad et al.
patent: 5808857 (1998-09-01), Stevens
patent: 5821033 (1998-10-01), Cromack et al.
patent: 6426864 (2002-07-01), O'Phelan et al.
patent: 6699265 (2004-03-01), O'Phelan et al.
patent: 6736956 (2004-05-01), Hemphill et al.
patent: 7180727 (2007-02-01), Poplett
patent: 2003/0030969 (2003-02-01), Farahmandi et al.
patent: 2003/0072124 (2003-04-01), O'Phelan et al.
patent: 2003/0195568 (2003-10-01), O'Phelan et al.
patent: 2004/0019268 (2004-01-01), Schmidt et al.
patent: 2004/0039421 (2004-02-01), O'Phelan et al.
patent: 2004/0114311 (2004-06-01), O'Phelan et al.
patent: 2004/0127952 (2004-07-01), O'Phelan et al.
patent: 2004/0220627 (2004-11-01), Crespi et al.
patent: 2006/0174463 (2006-08-01), O'Phelan et al.
patent: 02-231582 (2002-08-01), None
Porter, Mark C., “Handbook of Industrial Membrane Technology”,Handbook of Industrial Membrane Technology, Noyes Publications, (1990),623 Pages.
Schmidt, Brian L., et al., “Configurations and Methods for Making Capacitor Connections”, U.S. Appl. No. 09/706/576, filed Nov. 3, 2000, 26 pgs.
“Non-Final Office Action mailed Oct. 17, 2007 in U.S. Appl. No. 11/379,284”, 36 pgs.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for providing flexible partially etched... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for providing flexible partially etched..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for providing flexible partially etched... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3909547

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.