Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1989-08-14
1990-08-14
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
118 501, 118728, 118623, 156646, 156657, 156662, 156345, 20419232, 20429803, 427 38, H01L 21306, B44C 122, C03C 1500, C03C 2506
Patent
active
049484583
ABSTRACT:
An apparatus for producing a planar plasma in a low pressure process gas includes a chamber and an external planar coil. Radiofrequency resonant current is induced in the planar coil which in turn produces a planar magnetic field within the exclosure. The magnetic field causes circulating flux of electrons which in turn produces a planar region of ionic and radical species. The system may be used for plasma treatment of a variety of planar articles, typically semiconductor wafers which are oriented parallel to the plasma within the enclosure.
REFERENCES:
patent: 4368092 (1983-01-01), Steinberg et al.
patent: 4421898 (1984-02-01), Reinberg et al.
patent: 4557819 (1985-12-01), Meacham et al.
patent: 4626312 (1986-12-01), Tracy
patent: 4668338 (1987-05-01), Maydan et al.
patent: 4668365 (1987-05-01), Foster et al.
Skidmore (1989) Semiconductor International, Jun. 1989, pp. 74-79.
Lam Research Corporation
Powell William A.
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