Method and apparatus for processing samples

Details Method and apparatus for processing samples Method and apparatus for processing samples

2006-01-24

2006-01-24

Angebranndt, Martin (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C438S715000, C438S720000, C438S710000, C438S706000, C438S963000, C438S734000, C438S712000, C156S345390, C156S345540, C156S345310, C134S001200, C134S001300

Reexamination Certificate

active

06989228

ABSTRACT:
Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for removing residual corrosive compounds formed by the sample treatment, (c) for wet-processing of the samples and (d) for dry-processing the samples. A plurality of wet-processing treatments of a sample can be performed. The wet-processing apparatus can include a plurality of wet-processing stations. The samples can either be passed in series through the plurality of wet-processing stations, or can be passed in parallel through the wet-processing stations.

REFERENCES:
patent: 4015706 (1977-04-01), Goffredo et al.
patent: 4428796 (1984-01-01), Milgram
patent: 4481070 (1984-11-01), Thomas et al.
patent: 4487678 (1984-12-01), Noguchi et al.
patent: 4575408 (1986-03-01), Bok
patent: 4722355 (1988-02-01), Moe et al.
patent: 4810935 (1989-03-01), Boswell
patent: 4816098 (1989-03-01), Davis et al.
patent: 4855252 (1989-08-01), Peterman et al.
patent: 4923584 (1990-05-01), Bramhall, Jr. et al.
patent: 5007981 (1991-04-01), Kawasaki et al.
patent: 5200017 (1993-04-01), Kawasaki et al.
patent: 5252881 (1993-10-01), Muller et al.
patent: 5868854 (1999-02-01), Kojima et al.
patent: 5952245 (1999-09-01), Torii et al.
patent: 6036816 (2000-03-01), Kojima et al.
patent: 6077788 (2000-06-01), Kawasaki et al.
patent: 6254721 (2001-07-01), Kojima et al.
patent: 6537415 (2003-03-01), Kojima et al.
patent: 6537417 (2003-03-01), Kojima et al.
patent: 6656846 (2003-12-01), Kojima et al.
patent: 2002/0023720 (2002-02-01), Kojima et al.
patent: 2002/0043340 (2002-04-01), Kojima et al.
patent: 0219826 (1985-10-01), None
patent: 0187249 (1985-11-01), None
patent: 247603 (1987-05-01), None
patent: 57-2585 (1982-07-01), None
patent: 60-145625 (1985-01-01), None
patent: 63-9121 (1988-01-01), None
patent: 84/01084 (1984-03-01), None
Elliot, David J., “Integrated Circuit Fabrication Technology” 1982, pp. 57-59, 256-257, 267, 270-275.
Endo JP 62-150351 (abstract only).
Patent Abstracts of Japan, JP-A-55 072040, vol. 004, No. 117, Aug. 20, 1980.
Database WPI, Derwent Publications Ltd. JP-A-63 157870, Jun. 30, 1988.
Database WPI, Derwent Publications Ltd. JP-A-63 204726, Aug. 24, 1988.

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