Method and apparatus for photomask etching

Details Method and apparatus for photomask etching Method and apparatus for photomask etching

2011-06-21

2011-06-21

Paschall, Mark H (Department: 3742)

Electric heating

Metal heating

By arc

C219S121440, C219S121410

Reexamination Certificate

active

07964818

ABSTRACT:
A method of fabricating yttria parts is provided herein. In one embodiment, the method includes sintering a yttria sample, machining the sintered sample to form a part, and annealing the part in a three-stage process that includes heating the part at a predetermined heating rate, maintaining the part at a constant annealing temperature, and cooling the part at a predetermined cooling rate.

REFERENCES:
patent: 4732622 (1988-03-01), Jones
patent: 4755492 (1988-07-01), Greskovich et al.
patent: 5096880 (1992-03-01), Rybka
patent: 5188676 (1993-02-01), Taylor
patent: 5578145 (1996-11-01), Adamson et al.
patent: 6853141 (2005-02-01), Hoffman et al.
patent: 6949486 (2005-09-01), Sasaki et al.
patent: 2004/0159984 (2004-08-01), Isomura et al.
patent: 2006/0000802 (2006-01-01), Kumar et al.
patent: 2006/0043067 (2006-03-01), Kadkhodayan et al.
patent: 2006/0243358 (2006-11-01), Colburn et al.
patent: 2008/0207432 (2008-08-01), Hamada
patent: 0 263 662 (1988-04-01), None
patent: 63123813 (1988-05-01), None
patent: 2002 068838 (2002-03-01), None
patent: 2002 255647 (2002-09-01), None
patent: 2004 269350 (2004-09-01), None
patent: 2004269350 (2004-09-01), None
patent: 2004 292270 (2004-10-01), None
patent: 2005 170728 (2005-06-01), None
patent: 2005 335991 (2005-12-01), None
patent: 2006 021990 (2006-01-01), None
patent: 20060054358 (2006-05-01), None
patent: 10-2006-0054358 (2008-05-01), None
patent: WO-2005009919 (2005-02-01), None
{hacek over (S)}ajgalik, “Importance of Chemistry in High-Tech Ceramics Design”,Pure Appl. Chem., vol. 74, No. 11, pp. 2137-2144, 2002.
Notice of Final Rejection for Korean Patent Application No. 10-2007-0108776 dated Apr. 27, 2009.
Extended European Search Report dated Feb. 21, 2008 for Application No. 07018393.4.
Notice to File a Response for Korean Patent Application No. 10-2007-0108776 dated Jul. 28, 2009.
Office Action dated Oct. 21, 2008 for Korean Patent Application No. 10-2007-0108776.

Affiliated with

Also associated with

Rating

Method and apparatus for photomask etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for photomask etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for photomask etching will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2644036