Optics: measuring and testing – With plural diverse test or art
Reexamination Certificate
2007-01-02
2007-01-02
Lee, Hwa (Andrew) (Department: 2877)
Optics: measuring and testing
With plural diverse test or art
C356S326000
Reexamination Certificate
active
10744711
ABSTRACT:
A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the optics assembly in two dimensions relative to the substrate.
REFERENCES:
patent: 5091320 (1992-02-01), Aspnes et al.
patent: 5213985 (1993-05-01), Sandroff et al.
patent: 5313044 (1994-05-01), Massoud et al.
patent: 6348126 (2002-02-01), Hanawa et al.
patent: 6410449 (2002-06-01), Hanawa et al.
patent: 6449038 (2002-09-01), Stolze
patent: 6509960 (2003-01-01), Johnson et al.
patent: 6528751 (2003-03-01), Hoffman et al.
patent: 6657736 (2003-12-01), Finarov et al.
patent: 2002/0054290 (2002-05-01), Vurens et al.
patent: 2003/0047449 (2003-03-01), Hanawa et al.
patent: 0898 300 (1999-02-01), None
patent: 2036418 (1995-05-01), None
patent: WO03/041123 (2003-05-01), None
PCT International Search Report; Mail date Jul. 4, 2005; pp. 1-2.
Davis Matthew F.
Lian Lei
Netchitaliouk Andrei Ivanovich
Uo Yasuhiro
Willwerth Michael D.
Applied Materials Inc.
Geisel Kara
Lee Hwa (Andrew)
Moser IP Law Group
LandOfFree
Method and apparatus for performing limited area spectral... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for performing limited area spectral..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for performing limited area spectral... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3751558