Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2011-04-12
2011-04-12
Decady, Albert (Department: 2121)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S030000, C700S031000, C700S047000
Reexamination Certificate
active
07925369
ABSTRACT:
A method includes defining a reference model of a system having a plurality of terms for modeling data associated with the system. A reference fit error metric is generated for the reference model. A set of evaluation models each having one term different than the reference model is generated. An evaluation fit error metric for each of the evaluation models is generated. The reference model is replaced with a selected evaluation model responsive to the selected evaluation model having an evaluation fit error metric less than the reference fit error metric. The model evaluation is repeated until no evaluation model has an evaluation fit error metric less than the reference fit error metric. The reference model is trained using the data associated with the system, and the trained reference model is employed to determine at least one characteristic of the system.
REFERENCES:
patent: 7042551 (2006-05-01), Ausschnitt
patent: 7653890 (2010-01-01), Tsai et al.
patent: 2005/0222781 (2005-10-01), Yue et al.
Ina et al. “Focus and Dose Controls, and their application in Lithography” Proc. of SPIE vol. 6518, pp. 651807-1 to 651807-8, Apr. 2007.
Lensing et al. “Lithography Process Control using Scatterometry Metrology and Semi-Physical Modeling” Proc. of SPIE vol. 6518, pp. 651804-1 to 651804-12, Apr. 4, 2007.
Mack et al. “Improved Model for Focus-Exposure Data Analysis” Proc. SPIE vol. 5038, pp. 396-405, 2003.
Zhou et al. “Advanced Exposure and Focus Control by Proximity Profile Signature Matching” Proc. SPIE vol. 6155, pp. 61550H-1 to 61550H-11, 2006.
“Modeling for Profile-Based Process-Window Metrology”, by Ausschnitt , et al, Feb. 26, 2005, p. 1-10.
Chauhan Siddharth
Lensing Kevin R.
Stirton James Broc
De'cady Albert
Garland Steven R
Globalfoundries Inc.
Williams Morgan & Amerson P.C.
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