Method and apparatus for monitoring etching

Details Method and apparatus for monitoring etching Method and apparatus for monitoring etching

1980-05-19

1981-09-15

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156646, 156665, 204192E, 356416, 356425, 356437, H01L 21306, C23F 100

Patent

active

042891884

ABSTRACT:
Method and apparatus for monitoring a dry etching process using gas plasma, wherein a ratio of a spectrum intensity which varies depending on the process of the etching process to a spectrum intensity which is independent of the process of the etching process is determined and a resulting signal intensity is monitored. The completion of the etching process can be exactly determined irrespective of variation of the etching conditions.

REFERENCES:
patent: 4198261 (1980-04-01), Busta et al.
patent: 4246060 (1981-01-01), Keller

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