Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1999-03-12
2000-08-08
Font, Frank G.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
356357, 356372, 3562375, 250372, 250341, G01B 1106, G01B 1100, G01N 2100, G01J 142
Patent
active
061009857
ABSTRACT:
A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two locally adjacent elements having different optical properties in respect of an incident radiation. An optical model, based on at least some of the features of the structure is provided. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area, which is substantially larger than a surface area of the structure defined by the grid cycle, is illuminated by an incident radiation of a preset substantially wide wavelength range. Light component substantially specularly reflected from the measurement area is detected and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.
REFERENCES:
patent: 4740082 (1988-04-01), Young
patent: 4899055 (1990-02-01), Adams
patent: 4999014 (1991-03-01), Gold et al.
patent: 5087121 (1992-02-01), Kakuchi et al.
patent: 5361137 (1994-11-01), Aton et al.
patent: 5702956 (1997-12-01), Ying et al.
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5898500 (1999-04-01), Canteloup et al.
patent: 5900633 (1999-03-01), Solomon et al.
patent: 5946102 (1999-08-01), Holcomb
patent: 5959731 (1999-09-01), Jones
Y. Ushio, T. Ueda, H. Nakahira, E. Matsukawa, M. Koyama, "In-Situ Monitoring of CMP Process Utilizing 0-Order Spectrometry", CMP-MIC Conferences, Feb. 11-12, 1999, pp. 23-29.
Finarov Moshe
Scheiner David
Font Frank G.
Nova Measuring Instruments Ltd.
Punnoose Roy M.
LandOfFree
Method and apparatus for measurements of patterned structures does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for measurements of patterned structures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for measurements of patterned structures will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1155671