Method and apparatus for low energy electron enhanced etching of

Details Method and apparatus for low energy electron enhanced etching of Method and apparatus for low energy electron enhanced etching of

1998-11-24

2000-02-22

Breneman, Bruce

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 66, 216 67, 216 68, H05H 100

Patent

active

060276630

ABSTRACT:
A method-of low-damage, anisotropic etching of substrates including mounting the substrate upon the anode in a DC plasma reactor and subjecting the substrate to a plasma of low-energy electrons and a species reactive with the substrate. An apparatus for conducting low-damage, anisotropic etching including a DC plasma reactor, a permeable wall hollow cold cathode, an anode, and means for mounting the substrate upon the anode.

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