Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate
2004-02-23
2008-10-07
Hassanzadeh, Parviz (Department: 1792)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
Having glow discharge electrode gas energizing means
Reexamination Certificate
active
07431796
ABSTRACT:
An apparatus for low-damage, anisotropic etching of substrates having the substrate mounted upon a mechanical support located within an ac or dc plasma reactor. The mechanical support is independent of the plasma reactor generating apparatus and capable of being electrically biased. The substrate is subjected to a plasma of low-energy electrons and a species reactive with the substrate. An additional structure capable of being electrically biased can be placed within the plasma to control further the extraction or retardation of particles from the plasma.
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Choutov Dmitri A.
Gillis Harry P.
Martin Kevin P.
Arancibia Maureen G
Georgia Tech Research Corporation
Hassanzadeh Parviz
Thomas Kayden Horstemeyer & Risley LLP
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