Method and apparatus for inverting samples in a process

Coating apparatus – Gas or vapor deposition – Multizone chamber

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Details

118723E, 118731, 118728, 20429815, 414935, 414940, 414941, B25J 302, B25J 304, B25J 1500, C23C 1600

Patent

active

054218896

ABSTRACT:
The invention provides apparatus and methods for improving systems which expose samples to reactive plasmas, and more particularly for inverting the sample within these systems. The systems are of the type which have one or more process chambers, at least one intermediate chamber, and a robot transport mechanism to transport the sample between the several chambers. The invention includes flipping and gripping assemblies which mount within the intermediate chamber. These assemblies grasp and remove the sample as transported by the robot mechanism, and invert the sample within the intermediate chamber. The inverted sample is re-positioned at the robot mechanism so that the sample can be transported to one or more process chambers for deposition in a "face down" orientation, which reduces contamination.

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