Coating apparatus – With indicating – testing – inspecting – or measuring means
Patent
1991-02-20
1992-04-07
Simmons, David A.
Coating apparatus
With indicating, testing, inspecting, or measuring means
118715, 118723, 427 10, 156626, 156345, H01L 2100
Patent
active
051017644
ABSTRACT:
A method and apparatus for sensing radiation 26 indicative of at least one process variable in a semiconductor process chamber 10 in which a reactant gas reacts to effect changes in a silicon wafer 12. The method comprises positioning a substantially transparent window 22 in a conduit 14 leading to the wafer 12 and then flowing the reactant gas in the conduit 14 past the window 22 and toward the wafer 12. The radiation 26 is then sensed through the window 22. In the preferred embodiment the window 22 is positioned with an optical path along the center axis of the conduit 14. Other systems and methods are also disclosed.
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patent: 4989544 (1991-02-01), Yoshikawa et al.
"Controlling Deposition of Polymeric Coatings", by Gambino et al.; IBM; vol. 16, No. 9, 2-74, pp. 3065-3067.
Bienstock Rachelle
Huang Steve S.
Hwang Ming
Loewenstein Lee M.
Tang Thomas E.
Barndt B. Peter
Donaldson Richard L.
Goudreau George
Kesterson James C.
Simmons David A.
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