Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-09-18
2007-09-18
Stafira, Michael P. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237400, C356S237500
Reexamination Certificate
active
10903852
ABSTRACT:
In a method for inspecting a defect in accordance with one aspect of the present invention, an object is divided into a plurality of regions. Reflectivity of each of the plurality of regions is obtained. Amplification ratio for each region is determined using the reflectivity. A light is irradiated onto the regions. A light reflected from a first region is amplified by a first amplification ratio that is determined for the first region. Moving the irradiated light from the first region to a second region is detected. A light reflected from the second region is amplified by a second amplification ratio that is determined for the second region. The amplified lights from the first region and the second region are analyzed to determine an existence of a defect on the object.
REFERENCES:
patent: 4902131 (1990-02-01), Yamazaki et al.
patent: 5105092 (1992-04-01), Natsubori et al.
patent: 6496256 (2002-12-01), Eytan et al.
patent: 6833913 (2004-12-01), Wolf et al.
patent: 06-249791 (1994-09-01), None
patent: 1988-0000750 (1983-12-01), None
patent: 1020020030674 (2002-04-01), None
English language abstract of Korean Publication No. 1988-0000750.
English language abstract of Korean Publication No. 1020020030674.
English language abstract of Japanese Publication No. 06-249791 , Sep. 9, 1994.
Choi Sun-Yong
Chon Sang-Mun
Jun Chung-Sam
Kim Joung-Soo
Kim Moon-Kyung
Marger & Johnson & McCollom, P.C.
Stafira Michael P.
LandOfFree
Method and apparatus for inspecting defects does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for inspecting defects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for inspecting defects will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3785153