Method and apparatus for inspecting a substrate

Details Method and apparatus for inspecting a substrate Method and apparatus for inspecting a substrate

2006-09-26

2006-09-26

Pham, Hoa (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Reexamination Certificate

active

07113274

ABSTRACT:
In a method and an apparatus for inspecting defects on a substrate using a light beam, a light source irradiates light beams having different wavelengths onto the substrate. A detector detects first lights scattered from a surface of the substrate and second lights scattered from impurities on the substrate by irradiation of the light beams. An operation unit compares first intensities of the first lights with second intensities of the second lights in order to produce differential values therebetween, and selects a wavelength corresponding to a maximum value of the differential values. An inspection process for inspecting the defects on the substrate is performed using a light beam having the selected wavelength.

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