Method and apparatus for improving refractive index of dielectri

Details Method and apparatus for improving refractive index of dielectri Method and apparatus for improving refractive index of dielectri

1995-12-22

1999-04-27

Dang, Thi

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

438788, 118723E, C23C 1600, H01L 2100

Patent

active

058977112

ABSTRACT:
A method and an apparatus for depositing a dielectric film on a substrate in a plasma process chamber wherein the uniformity of the refractive index of the film is improved. The method involves introducing an oxygen reactant and a silicon reactant into the process chamber and generating a plasma, contacting the substrate with the plasma and depositing a SiO.sub.x film thereon. To control uniformity of the refractive index of the film, a second oxygen reactant is injected locally at a position at which it is desired to lower the refractive index. The second oxygen reactant can be O.sub.2 which is injected at the periphery of the substrate. The gas injection apparatus includes a substrate support below the substrate and a deposition shield surrounding the substrate. The shield contains gas injection outlets directed toward the periphery of the substrate for supplying the O.sub.2 to a region above the outer periphery of the substrate.

REFERENCES:
patent: 3993509 (1976-11-01), McGinty
patent: 4184188 (1980-01-01), Briglia
patent: 4384918 (1983-05-01), Abe
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4412906 (1983-11-01), Sato et al.
patent: 4512283 (1985-04-01), Bonifield et al.
patent: 4614639 (1986-09-01), Hegedus
patent: 4902934 (1990-02-01), Miyamura et al.
patent: 4996077 (1991-02-01), Moslehi et al.
patent: 5162633 (1992-11-01), Sonobe et al.
patent: 5200232 (1993-04-01), Tappan et al.
patent: 5384008 (1995-01-01), Sinha et al.
patent: 5415728 (1995-05-01), Hasegawa et al.
patent: 5498313 (1996-03-01), Bailey et al.
patent: 5571576 (1996-11-01), Quian et al.

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