Method and apparatus for improved ellipsometric measurement...

Details Method and apparatus for improved ellipsometric measurement... Method and apparatus for improved ellipsometric measurement...

2008-07-01

2008-07-01

Punnoose, Roy M (Department: 2886)

Optics: measuring and testing

By polarized light examination

Of surface reflection

C356S364000

Reexamination Certificate

active

11688366

ABSTRACT:
A method for implementing ellipsometry for an ultrathin film includes directing a polarized light beam incident upon a sample surface, receiving an initial reflected beam from the sample surface and redirecting the initial reflected beam back upon said sample surface one or more times so as to produce a final reflected beam. The final reflected beam is received through an analyzer and at a detector so as to determine characteristics of the ultrathin film.

REFERENCES:
patent: 4873430 (1989-10-01), Juliana et al.
patent: 2002/0180091 (2002-12-01), Norley et al.
patent: 2002/0180991 (2002-12-01), Takoudis et al.
patent: 2003/0227623 (2003-12-01), Zhan et al.
patent: 2004/0085544 (2004-05-01), De Groot

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