Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1987-12-22
1989-05-30
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430 1, 430269, 430311, 430322, 156643, 2504923, 350 37, 35016211, 427 38, 427 531, 427 541, 437 20, 437229, G03C 516, G02B 532
Patent
active
048350885
ABSTRACT:
The exposure component (10) of a photo-etching system for a semiconductor wafer (28) includes a laser (12) that shines coherent light through an expansion lens (14) and then a contraction lens (16) to supply a spherically convergent beam of light through a lensless-Fourier-transform hologram (22) and onto the semiconductor wafer (28). The wafer (28) is located tangent to a hemisphere centered on the hologram (22) that has the focal point (26) of the convergent spherical beam at the middle of its curved surface. This forms a reduced version of the source image from which the hologram (22) was formed and achieves feature sizes significantly smaller than those attainable with conventional mask-type systems employing light of the same wavelength.
REFERENCES:
patent: 3712813 (1973-01-01), Ross et al.
James E. Harvey, "Fourier Treatment of Near-Field Scalar Diffraction Theory", Am. J. Phys. 47(11), Nov. 1979, pp. 974-980.
Stroke et al., "Three-Dimensional Holography with `Lensless` Fourier-Transform Holograms and Coarse P/N Polaroid Film", J. Opt. Soc. Am. tt, 1327 (1965), pp. 1327-1328.
George W. Stroke, "Lensless Fourier-Transform Method for Optical Holography", Applied Physics Letter, vol. 6, No. 10, May 15, 1965, pp. 201-203.
Dees Jos,e G.
Submicron Structures, Inc.
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