Heat exchange – Structural installation
Reexamination Certificate
2005-10-18
2005-10-18
Ciric, Ljiljana (Department: 3753)
Heat exchange
Structural installation
C165S058000, C438S799000
Reexamination Certificate
active
06955211
ABSTRACT:
A method and apparatus for controlling the temperature of at least one gas flowing into a processing chamber is provided. In one embodiment, a gas temperature control apparatus for semiconductor processing includes a gas delivery line coupled between a processing chamber and a gas source. An enclosure substantially encloses the gas delivery line and is adapted to flow a heat transfer fluid away from the processing chamber.
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Chen Ling
Ku Vincent W.
Ouye Alan H.
Wu Dien-Yeh
Wysok Irena
Applied Materials Inc.
Ciric Ljiljana
Moser Patterson & Sheridan LLP
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