Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1987-10-15
1990-01-30
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430311, 430325, 430326, 430327, 430330, 430967, G03C 516
Patent
active
048973378
ABSTRACT:
A method for forming a highly precise resist pattern with good reproducibility has the steps of: applying a resist material to a substrate to form a resist film; baking the resist film; cooling the resist film in a controlled manner; selectively irradiating the resist film with one of electromagnetic waves in a predetermined wavelength range and particle beam having predetermined energy; and developing the resist film to form a resist pattern.
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patent: 4704348 (1987-11-01), Koizumi et al.
patent: 4717645 (1988-01-01), Kato et al.
"Resists for Fine-Line Lithography" by Michael Hatzakis; Proceedings of the IEEE, vol. 71, No. 5, May 1983, pp. 570-574.
"Integrated Circuit Fabrication Technology" by David J. Elliott McGraw-Hill Book Company, pp. 312-319.
"Prebaking Positive Photoresists" by Gordon MacBeth, Eastman Kodak Co., Interface '82, Microelectronics Seminar, San Diego, Calif., Oct. 22, 1982.
"Shipley Microposit Photoresist Technical Manual", Oct., 1982.
"Photoresist Materials and Processes" by W. S. DeForest; McGraw Hill Book Company, 1975.
Kato Yoshihide
Kirita Kei
Shigemitsu Fumiaki
Shinozaki Toshiaki
Tsuchiya Takashi
Dees Jos,e G.
Tokyo Shibaura Denki Kabushiki Kaisha
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