Method and apparatus for forming resist pattern

Details Method and apparatus for forming resist pattern Method and apparatus for forming resist pattern

1989-11-27

1991-09-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430325, 430326, 430327, 430330, G03C 516

Patent

active

050513389

ABSTRACT:
A method for forming a highly precise resist pattern with good reproducibility has the steps of: applying a resist material to a substrate to form a resist film; baking the resist film; cooling the resist film in a controlled manner; selectively irradiating the resist film with one of electromagnetic waves in a predetermined wavelength range and particle beam having predetermined energy; and developing the resist film to form a resist pattern.

REFERENCES:
patent: 4717645 (1988-01-01), Kato et al.

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