Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1985-10-22
1988-01-05
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430311, 430325, 430326, 430327, 430330, 430967, 4273741, G03C 500
Patent
active
047176458
ABSTRACT:
A method for forming a highly precise resist pattern with good reproducibility has the steps of: applying a resist material to a substrate to form a resist film; baking the resist film; cooling the resist film in a controlled manner; selectively irradiating the resist film with one of the electromagnetic waves in a predetermined wavelength range and particle beam having predetermined energy; and developing the resist film to form a resist pattern.
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Shigemitsu et al., "Highly Sensitized E-Beam Resist by Means of Quenching", SPIE Proceedings, vol. 771, Mar. 1987.
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Patents Abstracts of Japan, vol. 8, No. 48, (P-258), [1485], 3rd Mar. 1984; & JP-A-58 199 349, (Tokyo Denki K. K.), 19-11-1983.
Kato Yoshihide
Kirita Kei
Shigemitsu Fumiaki
Shinozaki Toshiaki
Tsuchiya Takashi
Dees Jos,e G.
Kittle John E.
Tokyo Shibaura Denki Kabushiki Kaisha
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